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NY CREATES Builds NanoFab Reflection Facility

Published 1/24/2025
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The New York Center for Research, Economic Advancement, Technology, Engineering, and Science (NY CREATES) is constructing the 310,000-sf NanoFab Reflection (NFR) facility in Albany, N.Y. Representing an expansion of the existing Albany NanoTech Complex, the four-story research and development building will feature a 50,000-sf ISO 5 cleanroom, complemented by approximately 50,000 sf of non-clean sub-fab space. This center for semiconductor innovation will enable the development of next-generation computer chips that are faster and more energy efficient, and accelerate the commercialization of new technologies. Addressing a crucial need for domestic chip production capacity, the NFR will drive economic growth in the region and support workforce training initiatives. The project also includes a two-story, 9,000-gsf structure for Hazardous Production Materials (HPM) storage, a high-voltage switchyard upgrade, and a new 900-car parking garage.

Upon completion in 2026, NY CREATES will be able to move forward with the $10 billion High NA EUV Lithography Center in collaboration with key industry, government, and academic partners. Utilizing extreme ultraviolet radiation, EUV lithography is used to create the most intricate layers of microchips. The initiative is supported by $1 billion in state funding through Empire State Development, which includes the purchase of the EXE:5200 High NA EUV scanner manufactured by ASML. The Albany NanoTech complex will be the home of the CHIPS for America EUV Accelerator, a National Science and Technology Council facility established through the U.S. CHIPS & Science Act.

To meet the challenges associated with delivering an advanced wafer fabrication center on an active site, the design-build team is leveraging BIM and virtual design and construction (VDC) tools, Lean methodology, and modular and offsite manufacturing strategies to meet an ambitious target schedule and significantly reduce costs. 

Arcadis is providing architecture and engineering services for the expansion, with Gilbane and DPS’s Advanced Technology Group acting as joint venture construction manager. Eaton is supplying low- and medium-voltage switchgear to provide centralized control and protection for sensitive electronic devices throughout the NanoFab Reflection building. NY CREATES is also applying Eaton’s Brightlayer electrical power monitoring system across its Albany NanoTech Complex to streamline facility management through visibility into energy systems, leading to the identification of opportunities to reduce consumption and avoid unplanned downtime. Other firms contributing their expertise include CHA, Colin Gordon Associates, Pizzano Consulting Engineers, Unistress Corporation, and Applied High Voltage

Organization Project Role
Arcadis
Architect & Engineer
Gilbane
Joint Venture Construction Manager
DPS
Joint Venture Construction Manager
Eaton
Switchgear & FM Solutions Provider
CHA
Consultant
Colin Gordon Associates
Vibration & Acoustics Consultant
Pizzano Consulting Engineers
Engineering Consultant
Unistress Corporation
Precast/Prestressed Concrete Solution Provider
Applied High Voltage
Electrical EPC Contractor