Toppan Photomasks Expands in Shanghai

Toppan Photomasks announced plans in November of 2011 to expand its Shanghai manufacturing operation to better serve China's rapidly growing semiconductor industry. The $20 million project will significantly increase the company's capacity to produce photomasks, which are used to manufacture semiconductor devices, while also improving its capability to produce more detailed photomasks with design features as small as 90 nanometers. The expansion, which includes construction of an additional 53,281-sf manufacturing facility adjacent to the company's existing Shanghai operation, will provide new cleanroom space as well as enhanced lithography, process, inspection, and repair capabilities. Construction will begin in early 2012 and reach completion by December of 2012. The facility is created in partnership with the Shanghai Institute of Microsystems and Information Technology.